Jan Unarski; Wojciech Wach; Piotr Ciępka
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Lecture
2015
24. EVU Conference, Edinburgh
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Over the past two years many expert opinions have been produced in which the LMK system of luminance measurement, presented at the 22 EVU Congress in Florence in 2013, has been applied. The system included the measurements of the luminance of obstacles and background, which were next used to determine an approximate obstacle visibility distance. The system has proved successful and despite troublesome calculations, yielded good results. In practice it is useful mainly in complex luminance situations (such as a non-typical obstacle or the presence of several objects producing glare) for which there are no ready made sighting rules, and, moreover, the “engineering intuition” cannot be trusted. In view of the above, this time the authors have focused on the description of some cases solved by means of LMK system. These study cases have led to some interesting conclusions.
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